[8] F. Gao, J.C. Cao, Q.B. Wang, R. Liu, S.W. Zhang, J.C. Liu*, X.Y. Liu. Properties of UV-cured self-healing coatings prepared with PCDL-based polyurethane containing multiple H-bonds, Progress in Organic Coatings, 2017, 113, 160-167.
https://doi.org/10.1016/j.porgcoat.2017.09.011
[7] X.F. Zheng, C.W. Ji, Q.T. Zeng, J.C. Liu*, R. Liu, Q.D. Mu, X.Y. Liu*. Synthesis of novel copolymer based on precipitation polymerization and its application in pPositive-tone photoresist, Journal of Polymer Research, 2017, 24, 198.
https://link.springer.com/article/10.1007/s10965-017-1370-9
[6] J.C. Liu*, K. Wang, Y.Z. Xie, F. Gao, Q.T. Zeng, Y. Yuan, R. Liu, X.Y. Liu. Novel partially bio-based fluorinated polyimides from dimer fatty diamine for UV-cured coating, Journal of Coatings Technology and Research, 2017, 14, 1325-1334.
https://link.springer.com/article/10.1007/s11998-017-9931-8
[5] X.M. Fei, W. Wei*, Y.Y. Tang, Y. Zhu, J. Luo, M.Q. Chen, X.Y. Liu. Simultaneous enhancements in toughness, tensile strength, and thermal properties of epoxy-anhydride thermosets with a carboxyl-terminated hyperbranched polyester. European Polymer Journal. 2017, 90, 431-441.
https://doi.org/10.1016/j.eurpolymj.2017.03.022
[4] H. Li, Z. Zhou, J.C. Liu*, X.F. Zheng, W.J. Xu, C.W. Ji, W.D. Shi, R. Liu, X.Y. Liu*. Novel one-component molecular glass photoresist based on cyclotriphosphazene containing t-butyloxy carbonyl group for i-line lithography, Journal of Polymer Research, 2017, 24, 62.
https://link.springer.com/article/10.1007/s10965-017-1221-8
[3] J.C. Liu*, Y.Z. Xie, K. Wang, Q.T. Zeng, R. Liu, X.Y. Liu. A nanocomposite consisting of carbon nanotubes and gold nanoparticles in an amphiphilic copolymer for voltammetric determination of dopamine, Paracetamol and Uric Acid, Mikrochimica Acta, 2017, 184, 1739-1745.
https://link.springer.com/article/10.1007/s00604-017-2185-4
[2] J.C. Liu, B.Q, Wang, Y, Yuan*, R, Liu, Z,Q. Li, X.Y. Liu. Synthesis of fluorinated polycarbonate-based polyurethane acrylate for UV-curable coatings, Journal of Coatings Technology and Research, 2017, 14, 233-241.
https://link.springer.com/article/10.1007/s11998-016-9847-8
[1] H. Li, Z. Zhou, J.C. Liu*, W.J. Xu, R. Liu, X.Y. Liu*. One-pot synthesis of molecular glass photoresists based on beta-cyclodextrin containing a t-butyloxy carbonyl group for i-line lithography, Polymer Bulletin, 2017, 74, 1091-1101.
https://link.springer.com/article/10.1007/s00289-016-1765-5
